On-Wafer FinFET-Based 3-D E-Beam Detector Cube for In Situ Monitoring of Advanced Lithography Processes Beyond 5 nm-Reference-Cited by-同舟云学术

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On-Wafer FinFET-Based 3-D E-Beam Detector Cube for In Situ Monitoring of Advanced Lithography Processes Beyond 5 nm

Published:2024-06 Issue:6 Volume:71 Page:3739-3745
ISSN:0018-9383
Container-title:IEEE Transactions on Electron Devices
language:
Short-container-title:IEEE Trans. Electron Devices

Author:

Teng Yu-Jie¹^ORCID,Chao Ho-Ting¹^ORCID,Chang Wei²^ORCID,Jeng Lin Burn³,Chih Yue-Der⁴,Chang Jonathan⁴,Jung Lin Chrong²,King Ya-Chin²^ORCID

Affiliation:

1. Institute of College of Semiconductor Research, National Tsing Hua University, Hsinchu, Taiwan

2. Institute of Electronics Engineering, National Tsing Hua University, Hsinchu, Taiwan

3. Institute of Photonics Technologies, National Tsing Hua University, Hsinchu, Taiwan

4. Design Technology Division, Taiwan Semiconductor Manufacturing Company, Hsinchu, Taiwan

Funder

Ministry of Science and Technology, Taiwan

Taiwan Semiconductor Manufacturing Company

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Link

http://xplorestaging.ieee.org/ielx7/16/10538150/10518004.pdf?arnumber=10518004

Reference37 articles.

1. On-Wafer FinFET-Based EUV/eBeam Detector Arrays for Advanced Lithography Processes

2. Extreme ultraviolet lithography

3. Pushing the limits of lithography

4. Ultrafast deep UV Lithography with excimer lasers

5. Research on comprehensive efficiency evaluation of key production facility for equipment based on rough set

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