Pushing the limits of lithography
Author:
Publisher
Springer Science and Business Media LLC
Subject
Multidisciplinary
Link
http://www.nature.com/articles/35023233.pdf
Reference15 articles.
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3. Okazaki, S. Resolution limits of optical lithography. J. Vac. Sci. Technol. B 9, 2829–2833 ( 1991).
4. Levenson, M. D. et al. Improving resolution in photolithography with a phase-shifting mask. IEEE Trans. Electron Devices 29, 1828 –1836 (1982).
5. Terasawa, T. et al. 0.3 μm optical lithography using a phase shifting mask . Proc. SPIE 1088, 25–33 (1989).
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