Study of the Thermal Stability of the Al / TiW / TiSi2 / Si Structure-Reference-Cited by-同舟云学术

Study of the Thermal Stability of the Al / TiW / TiSi2 / Si Structure

Published:1991-08-01 Issue:8 Volume:138 Page:2377-2381
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Furlan R.¹²³,Van der Spiegel J.¹²³,Swart J. W.¹²³

Affiliation:

1. Universidade de São Paulo, LSI‐EPUSP, C.P. 8174, São Paulo, SP, 01051, Brazil

2. Center for Sensors Technologies, Department of Electrical Engineering, University of Pennsylvania, Philadelphia, Pennsylvania 19104‐6390

3. Universidade de Campinas, DSIF‐FEE, C.P. 6101, Campinas, SP, 13081, Brazil

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.2085980/pdf

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