Systematic studies on reactive ion etch-induced deformations of organic underlayers-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Systematic studies on reactive ion etch-induced deformations of organic underlayers

Published:2011-03-17 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
Short-container-title:

Author:

Glodde Martin,Engelmann Sebastian,Guillorn Michael,Kanakasabapathy Sivananda,Mclellan Erin,Koay Chiew-Seng,Yin Yunpeng,Sankarapandian Muthumanickam,Arnold John C.,Petrillo Karen,Brink Markus,Miyazoe Hiroyuki,de Silva E. Anuja,Yusuff Hakeem,Yoon Kwang-sub,Wei Yayi,Wu Chung-hsi J.,Varanasi P. Rao

Publisher

SPIE

Cited by 21 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Etching characteristics of hydrogenated amorphous carbon with different sp 2 /sp 3 hybridization ratios in CF 4 /O 2 plasmas;Plasma Processes and Polymers;2021-08-26

2. Etching with electron beam-generated plasmas: Selectivity versus ion energy in silicon-based films;Journal of Vacuum Science & Technology A;2021-05

3. Utilizing photosensitive polymers to evaluate UV radiation exposures in different plasma chamber configurations;Journal of Vacuum Science & Technology A;2020-05

4. Highly substituted fullerene based spin-on organic hardmasks;Advances in Patterning Materials and Processes XXXVII;2020-03-23

5. Polybenzoxazole/graphene nanocomposite for etching hardmask;Journal of Industrial and Engineering Chemistry;2019-07

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP