Etching characteristics of hydrogenated amorphous carbon with different sp 2 /sp 3 hybridization ratios in CF 4 /O 2 plasmas-Reference-Cited by-同舟云学术

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Etching characteristics of hydrogenated amorphous carbon with different sp 2 /sp 3 hybridization ratios in CF 4 /O 2 plasmas

Published:2021-08-26 Issue:11 Volume:18 Page:2100075
ISSN:1612-8850
Container-title:Plasma Processes and Polymers
language:en
Short-container-title:Plasma Process Polym

Author:

Li Jie¹,Kim Sun J.¹,Han Seunghun¹,Kim Yongjae²,Chae Heeyeop¹²^ORCID

Affiliation:

1. School of Chemical Engineering Sungkyunkwan University (SKKU) Suwon Republic of Korea

2. Sungkyunkwan Advanced Institute of Nanotechnology (SAINT) Sungkyunkwan University (SKKU) Suwon Republic of Korea

Funder

National Research Foundation of Korea

Korea Institute of Energy Technology Evaluation and Planning

Korea Institute for Advancement of Technology

Publisher

Wiley

Subject

Polymers and Plastics,Condensed Matter Physics

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/ppap.202100075

Reference32 articles.

1. Diamond-like amorphous carbon

2. Ultrahigh Selective Etching of SiO[sub 2] Using an Amorphous Carbon Mask in Dual-Frequency Capacitively Coupled C[sub 4]F[sub 8]/CH[sub 2]F[sub 2]/O[sub 2]/Ar Plasmas

3. Etch Properties of Amorphous Carbon Material Using RF Pulsing in the O₂/N₂/CHF₃ Plasma

4. Systematic studies on reactive ion etch-induced deformations of organic underlayers

5. Diamond-like amorphous carbon layer film by an inductively coupled plasma system for next generation etching hard mask

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1. Etch Rate Uniformity Monitoring for Photoresist Etch Using Multi-channel Optical Emission Spectroscopy and Scanning Floating Harmonic Probe in an Inductively Coupled Plasma Reactor;Plasma Chemistry and Plasma Processing;2024-08-18

2. Influence of O2 content on surface modification of epoxy resin using He/CF4 atmospheric pressure plasma jet to improve surface flashover strength;Physics of Plasmas;2024-08-01

3. Transient-assisted plasma etching (TAPE): Concept, mechanism, and prospects;Journal of Vacuum Science & Technology A;2024-04-03

4. Surface wettability control and fluorination modeling of amorphous carbon films fluorinated with CF4 plasma;Applied Surface Science;2023-10

5. Effect of CF₄ concentration on the discharge dynamics and reactive species distribution of atmospheric nanosecond pulsed He plasma jet;Journal of Physics D: Applied Physics;2023-09-13

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