Hot electron relaxation and energy loss rate in silicon: Temperature dependence and main scattering channels

Abstract

In this work, we revisit the density functional theory (DFT)-based results for electron–phonon scattering in highly excited silicon. Using the state-of-the-art ab initio methods, we examine the main scattering channels, which contribute to the total electron–phonon scattering rate and the energy loss rate of photoexcited electrons in silicon as well as their temperature dependence. Both temperature dependence and the main scattering channels are shown to strongly differ for the total electron–phonon scattering rate and the energy loss rate of photoexcited electrons. While the total electron–phonon scattering rate increases strongly with temperature, the temperature dependence of the energy loss rate is negligible. Also, while acoustic phonons dominate the total electron–phonon scattering rate at 300 K, the main contribution to the energy loss rate comes from optical modes. In this respect, DFT-based results are found to disagree with conclusions of Fischetti et al. [Appl. Phys. Lett. 114, 222104 (2019)]. We explain the origin of this discrepancy, which is mainly due to differences in the description of the electron–phonon scattering channels associated with transverse phonons.