UV-ozone surface pretreatment for high quality ALD-grown ultrathin coatings on bismuth oxyhalide photocatalysts-Reference-Cited by-同舟云学术

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UV-ozone surface pretreatment for high quality ALD-grown ultrathin coatings on bismuth oxyhalide photocatalysts

Published:2025 Issue:14 Volume:17 Page:8690-8701
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Arbell Nitai¹²^ORCID,Regev Shakked¹²,Paz Yaron¹²^ORCID

Affiliation:

1. The Russell Berrie Nanotechnology Institute, Technion-Israel Institute of Technology, Haifa 3200003, Israel

2. The Wolfson Department of Chemical Engineering, Technion-Israel Institute of Technology, Haifa 3200003, Israel

Abstract

Illustration of the proposed layer-by-layer growth of alumina on BiOX substrates in the absence of (top) and following (bottom) UVOC pretreatment.

Funder

Russell Berrie Nanotechnology Institute, Technion-Israel Institute of Technology

Publisher

Royal Society of Chemistry (RSC)

Link

http://pubs.rsc.org/en/content/articlepdf/2025/NR/D4NR03749A

Reference68 articles.

1. Atomic Layer Deposition: An Overview

2. Conformality in atomic layer deposition: Current status overview of analysis and modelling

3. ALD Al₂O₃ gate dielectric on the reduction of interface trap density and the enhanced photo-electric performance of IGO TFT

4. Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal–Oxide–Semiconductor High-Electron-Mobility Transistors

5. Elegant design of electrode and electrode/electrolyte interface in lithium-ion batteries by atomic layer deposition

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