Author:
Nozaki S.,Kimura S.,Koizumi A.,Ono H.,Uchida K.
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference12 articles.
1. Low-Temperature and Low-Activation-Energy Process for the Gate Oxidation of Si Substrates
2. High-quality SiO2 film formation by highly concentrated ozone gas at below 600 °C
3. Nozaki Shinji, Kimura Seiji, Ono Hiroshi, Uchida Kazuo. Low-temperature formation of high-quality SiOx thin films by evaporation of SiO nanopowder. Digest of technical papers, The 13th international workshop on active-matrix flatpanel displays and devices, 2006, p. 19–22.
4. Selective formation of size-controlled silicon nanocrystals by photosynthesis in SiO nanoparticle thin film;Chen;IEEE Trans Nanotechnol,2006
5. Photo-modification and synthesis of semiconductor nanocrystals;Nozaki;Surf Sci,2007
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