Secondary ion mass spectrometry and its application to thin film characterization
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Elsevier
Reference235 articles.
1. Sputtering Ion Source for Solids
2. Secondary ion mass spectrometry round-robin study of relative sensitivity factors in gallium arsenide
3. Systematics of secondary‐ion‐mass spectrometry relative sensitivity factors versus electron affinity and ionization potential for a variety of matrices determined from implanted standards of more than 70 elements
4. Systematics of positive secondary ion mass spectrometry relative sensitivity factors for Si and SiO2measured using oxygen and argon ion bombardment
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