Preferential sputtering on multicomponent optical surfaces
Author:
Funder
University of Science and Technology of China
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference22 articles.
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2. Theory of sputtering. I. Sputtering yield of amorphous and polycrystalline targets;Sigmund;Phys. Rev.,1969
3. J.B. Malherbe Sputtering of compound semiconductor surfaces. II. Compositional changes and radiation-induced topography and damage, Crit. Rev. Solid State Mater. Sci. 19 1994 129.
4. Sputtering yields of compounds using argon ions;Seah;J. Phys. D Appl. Phys.,2010
5. Ion beam sputtering of multicomponent targets: surface composition change and cluster emission;Kudryavtsev;Tech. Phys.,2012
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1. Study on the surface modification of Ta2O5 bombarded by argon ions;Optical Materials Express;2022-11-07
2. Deconvolution models for determining the real surface composition of InP (1 0 0) after bombardment with 5 keV Ar ions at different angles;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2019-12
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