Depth profilometry of sputtered Ni ions implanted in Ti using pulsed argon and nitrogen plasmas-Reference-Cited by-同舟云学术

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Depth profilometry of sputtered Ni ions implanted in Ti using pulsed argon and nitrogen plasmas

Published:1997-09 Issue:2-3 Volume:93 Page:314-317
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Sarkissian A.H.,Cliche L.,Paradis E.,Leblanc J.B.

Publisher

Elsevier BV

Reference8 articles.

1. Plasma source ion-implantation technique for surface modification of materials

2. Plasma immersion ion implantation using plasmas generated by radio frequency techniques

3. Plasma immersion ion implantation for ULSI processing

4. Plasma immersion ion implantation of SiF4 and BF3 for sub-100 nm P+/N junction fabrication

Cited by 13 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Studies of an improved system for the radial implantation of radio-isotopes;Plasma Sources Science and Technology;2008-12-05

2. MODIFICATION OF WETTING PROPERTIES OF PMMA BY IMMERSION PLASMA ION IMPLANTATION;Surface Review and Letters;2008-08

3. Modification of wetting properties of CR39 by plasma source ion implantation;Applied Surface Science;2008-08

4. Online system for temperature and accumulated dose control in plasma-based ion implantation;Review of Scientific Instruments;2007-02-01

5. Co-axial ECR plasma system for radioactive ion implantation;Plasma Sources Science and Technology;2005-05-17

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