Influence of particle bombardment on microstructure and internal stresses of refractory metal suicides on silicon
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference11 articles.
1. Stress relaxation in tantalum silicide films by particle bombardment
2. Insitustress measurement of refractory metal silicides during sintering
3. Refractory silicides of titanium and tantalum for low-resistivity gates and interconnects
4. Elastic stiffness and thermal expansion coefficients of various refractory silicides and silicon nitride films
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