Formation and growth of electromigration induced islands in aluminum and in aluminum alloy films-Reference-Cited by-同舟云学术

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Formation and growth of electromigration induced islands in aluminum and in aluminum alloy films

Published:1993-01 Issue:1 Volume:223 Page:23-30
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Chang C.Y.,Vook R.W.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference11 articles.

1. Nucleation and Growth of Thin Films;Lewis,1978

2. Proc. 21st Annu. Reliability Physics Symp.;Thomas,1983

3. Low‐Loss Image for Surface Scanning Electron Microscope

4. Coating, Mechanical Constraints, and Pressure Effects on Electromigration

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2. Quasistatic and dynamic mechanical properties of Al–Si–Cu structural films in uniaxial tension;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2012-05

3. Healing processes in submicron Al interconnects after electromigration failure;Applied Physics Letters;1997-05-12

4. Electromigration in layered Al lines studied by in-situ ultra-high voltage electron microscopy;Thin Solid Films;1997-05

5. Electromigration of aluminum cathodes in polymer‐based electroluminescent devices;Applied Physics Letters;1996-12-16

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