Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion-Reference-Cited by-同舟云学术

Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion

Published:2014-02 Issue: Volume:552 Page:124-135
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Ylivaara Oili M.E.,Liu Xuwen,Kilpi Lauri,Lyytinen Jussi,Schneider Dieter,Laitinen Mikko,Julin Jaakko,Ali Saima,Sintonen Sakari,Berdova Maria,Haimi Eero,Sajavaara Timo,Ronkainen Helena,Lipsanen Harri,Koskinen Jari,Hannula Simo-Pekka,Puurunen Riikka L.

Funder

Finnish Centre of Excellence in Atomic Layer Deposition

Tekes

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference69 articles.

1. Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process

2. Surface Chemistry for Atomic Layer Growth

3. Atomic Layer Deposition: An Overview

4. Film Uniformity in Atomic Layer Deposition

5. Perfectly Conformal TiN and Al2O3 Films Deposited by Atomic Layer Deposition

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