Polyimide/fluorinated silica composite films with low dielectric constant and low water absorption

Abstract

In this study, KMnO4 was applied as an etchant to partially decompose the silica microspheres into mesoporous structures. 1H,1H,2H,2H-perfluorodecyltriethoxysilane was grafted onto the surface of the hollow silica. A fluorinated silica/polyimide hybrid material was prepared. Meanwhile, the influence of fluorinated silica on the dielectric property and moisture absorption property of the hybrid material was discussed. It is found that the fluorinated silica can lower the dielectric constant and hygroscopicity of the hybrid film. The fluorinated silica is characterized by strong hydrophobicity, good dispersibility, and good thermal stability. Even at a very low filling level of only 2 wt%, the dielectric constant of the polyimide hybrid is significantly reduced to 2.61 without sacrificing thermal stability. The water absorption rate of the polyimide hybrid film is reduced from approximately 3.1% to 2.1 wt%. Moreover, this provides a new idea for reducing the dielectric and water absorption properties of materials.