Research on chemical mechanical polishing of KTiOPO<sub>4</sub>crystal-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Research on chemical mechanical polishing of KTiOPO₄crystal

Published:2022-08-30 Issue: Volume: Page:
ISSN:
Container-title:2022 8th International Conference on Nanomanufacturing & 4th AET Symposium on ACSM and Digital Manufacturing (Nanoman-AETS)
language:
Short-container-title:

Author:

Guo Jiang¹,Shi Haohao¹,Pan Bo¹

Affiliation:

1. Dalian University of Technology,Key Laboratory for Precision and Non-traditional Machining Technology of Ministry of Education,Dalian,China

Funder

National Natural Science Foundation of China

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/10119459/10119460/10119517.pdf?arnumber=10119517

Reference25 articles.

1. Material removal rate of 6H-SiC crystal substrate CMP using an alumina (Al2O3) abrasive [J];jianxiu;Journal of Semiconductors,2012

2. Theoretical and experimental investigation of chemical mechanical polishing of W–Ni–Fe alloy

3. Influence of acid slurries on surface quality of LBO crystal in fixed abrasive CMP

4. Water-in-Oil Dispersion for KH2PO4(KDP) Crystal CMP

5. Research on Ultra-Precision Lapping Technology for Super-Smooth Surface of KTP Crystal

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP