A Promising Alternative to Conventional EBL: UV Lithography with Direct Laser Writing for Josephson Junction Patterning-Reference-Cited by-同舟云学术

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A Promising Alternative to Conventional EBL: UV Lithography with Direct Laser Writing for Josephson Junction Patterning

Published:2023-10-22 Issue: Volume: Page:
ISSN:
Container-title:2023 IEEE Nanotechnology Materials and Devices Conference (NMDC)
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Author:

Verna Alessio¹,Fasolo Luca¹,Zannoni Mario²,Giachero Andrea²,Labranca Danilo²,Origo Luca²,Faverzani Marco²,Moretti Roberto²,Enrico Emanuele¹

Affiliation:

1. Italian National Institute of Metrology Research, strada delle Cacce, 91,Torino,Italy,10135

2. University and of Milano-Bicocca and National Institute for Nuclear Physics (INFN) p zza della Scienza, 3,Physics Department “G. Occhialini”,Milan,Italy,20126

Funder

Nuclear Physics

Ministry of Defence

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/10343386/10343419/10343589.pdf?arnumber=10343589

Reference5 articles.

1. Al/AlOx/Al Josephson Junctions Fabricated by Shadow Evaporation Employing Multiple Symmetric Angled Depositions Per Channel

2. Beyond the effective length: How to analyze magnetic interference patterns of thin-film planar Josephson junctions with finite lateral dimensions

3. Evidence for Nonlocal Electrodynamics in Planar Josephson Junctions

4. Nonlocal electrodynamics of long ultranarrow Josephson junctions: Experiment and theory

5. Standard measurement method for normal state resistance and critical current of resistively shunted Josephson junctions

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