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Adaptive sampling methodology for in-line defect inspection

Published: Issue: Volume: Page:25-31
ISSN:
Container-title:IEEE/SEMI Conference and Workshop on Advanced Semiconductor Manufacturing 2005.
language:
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Author:

Ali Bousetta ,Andrew J. Cross

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx5/9832/30990/01438762.pdf?arnumber=1438762

Reference4 articles.

1. SPC Control (for Defect data);broughton;Internal KLA-Tencor Document,2002

2. Adaptive in-line Sampling Strategies for Semiconductors Manufacturing;kuo;ESRC,1997

3. Introduction to Sampling Optimization, Andrew Cross;cross;Internal KLA-Tencor Document,2003

4. In-line defect sampling methodology in yield management: an integrated framework

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Observational and experimental insights into machine learning-based defect classification in wafers;Journal of Intelligent Manufacturing;2025-01-25

2. Bayesian decision analysis for optimizing in-line metrology and defect inspection strategy for sustainable semiconductor manufacturing and an empirical study;Computers & Industrial Engineering;2023-08

3. Smart dynamic sampling for wafer at risk reduction in semiconductor manufacturing;2014 IEEE International Conference on Automation Science and Engineering (CASE);2014-08

4. Integration of scheduling and advanced process control in semiconductor manufacturing: review and outlook;2014 IEEE International Conference on Automation Science and Engineering (CASE);2014-08

5. Integration of scheduling and advanced process control in semiconductor manufacturing: review and outlook;Journal of Scheduling;2014-05-25

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