A Multiscale Attention Mechanism Super-Resolution Confocal Microscopy for Wafer Defect Detection-Reference-Cited by-同舟云学术

A Multiscale Attention Mechanism Super-Resolution Confocal Microscopy for Wafer Defect Detection

Published:2024 Issue: Volume: Page:1-12
ISSN:1545-5955
Container-title:IEEE Transactions on Automation Science and Engineering
language:
Short-container-title:IEEE Trans. Automat. Sci. Eng.

Author:

Sun Xuefeng¹^ORCID,Zhang Baoyuan¹,Wang Yushan²,Mai Jialuo²,Wang Yuhang³,Tan Jiubin⁴^ORCID,Wang Weibo⁴^ORCID

Affiliation:

1. Ministry of Industry and Information Technology, Institute of Ultra-Precision Optoelectronic Instrument Engineering and the Key Laboratory of Ultra-Precision Intelligent Instrumentation, Harbin Institute of Technology, Harbin, China

2. Harbin Institute of Technology, Harbin, China

3. College of Mechanical and Electrical Engineering, Northeast Forestry University, Harbin, China

4. Ministry of Industry and Information Technology, and the Advanced Nuclear and New Energy Research Institute, Institute of Ultra-Precision Optoelectronic Instrument Engineering, the Key Laboratory of Ultra-Precision Intelligent Instrumentation, Harbin Institute of Technology, Harbin, China

Funder

National Natural Science Foundation of China

Key Research and Development Program of Heilongjiang

China General Nuclear Power Corporation (CGN)-Harbin Institute of Technology (HIT) Advanced Nuclear and New Energy Research Institute

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Link

http://xplorestaging.ieee.org/ielx7/8856/4358066/10418839.pdf?arnumber=10418839

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