Discrete-Trap Effects on 3-D NAND Variability – Part I: Threshold Voltage
Author:
Affiliation:
1. Dipartimento di Elettronica, Politecnico di Milano, Informazione e Bioingegneria, Milan, Italy
2. Synopsys Inc., Mountain View, CA, USA
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Link
http://xplorestaging.ieee.org/ielx8/6245494/10416702/10643153.pdf?arnumber=10643153
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1. Reviewing the Evolution of the NAND Flash Technology
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4. A 1.67Tb, 5b/Cell Flash Memory Fabricated in 192-Layer Floating Gate 3D-NAND Technology and Featuring a 23.3Gb/mm2 Bit Density
5. Challenges of Flash Memory for Next Decade
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1. Discrete-Trap Effects on 3-D NAND Variability – Part II: Random Telegraph Noise;IEEE Journal of the Electron Devices Society;2024
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