Nonequilibrium Plasmas for Material Processing in Microelectronics
Author:
Affiliation:
1. Institute of Physics
2. Keio University
Publisher
Trans Tech Publications, Ltd.
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Link
https://www.scientific.net/MSF.282-283.47.pdf
Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Modulation of the plasma radial uniformity in pulsed dual-antenna inductively coupled plasmas;Physics of Plasmas;2023-06-01
2. Non-thermal Plasmas Chemistry as a Tool for Environmental Pollutants Abatement;Reviews of Environmental Contamination and Toxicology Vol 201;2009
3. Pulsed inductively coupled plasmas as a method to recoup uniformity: Three-dimensional modeling study;Applied Physics Letters;2004-08-02
4. Pulsed plasmas as a method to improve uniformity during materials processing;Journal of Applied Physics;2004-07
5. Angular anisotropy of electron energy distributions in inductively coupled plasmas;Journal of Applied Physics;2003-11
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