Accurate evaluation of specific contact resistivity between InAs/Ni–InAs alloy using a multi-sidewall transmission line method
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Link
https://iopscience.iop.org/article/10.35848/1347-4065/ab6cb3/pdf
Reference32 articles.
1. CMOS compatible self-aligned S/D regions for implant-free InGaAs MOSFETs
2. Highly Stable Self-Aligned Ni-InGaAs and Non-Self-Aligned Mo Contact for Monolithic 3-D Integration of InGaAs MOSFETs
Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Low specific contact resistance between InAs/Ni–InAs evaluated by multi-sidewall TLM;AIP Advances;2023-05-01
2. Scaling of GaSb/InAs Vertical Nanowire Esaki Diodes Down to Sub-10-nm Diameter;IEEE Transactions on Electron Devices;2022-04
3. Evaluation of interface traps inside the conduction band of InAs-on-insulator nMOSFET by self-consistent Hall-QSCV method;Applied Physics Letters;2021-09-06
4. Proposal and Experimental Demonstration of Ultrathin-Body (111) InAs-On-Insulator nMOSFETs With L Valley Conduction;IEEE Transactions on Electron Devices;2021-04
5. Subband Engineering by Combination of Channel Thickness Scaling and (111) Surface Orientation in InAs-On-Insulator nMOSFETs;2020 IEEE International Electron Devices Meeting (IEDM);2020-12-12
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