Organic Contaminant Detection of Silicon Wafers Using Negative Secondary Ions Induced by Cluster Ion Impacts
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,General Engineering
Link
http://stacks.iop.org/1882-0786/1/i=4/a=047002/pdf
Reference17 articles.
1. Hydrocarbon reaction with HF‐cleaned Si(100) and effects on metal‐oxide‐semiconductor device quality
2. Influence of silicon-wafer loading ambients in an oxidation furnace on the gate oxide degradation due to organic contamination
3. Impact of Organic Contaminants from the Environment on Electrical Characteristics of Thin Gate Oxides
4. Analysis of surface contaminants on gallium arsenide and silicon by high-resolution time-of-flight secondary ion mass spectrometry
5. Nonlinear effects in heavy‐ion sputtering
Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Time-of-flight secondary ion mass spectrometry with energetic cluster ion impact ionization for highly sensitive chemical structure characterization;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2013-11
2. Surface-sensitive Chemical Analysis of Organic Insulating Thin Films Using Negative Secondary Ions Induced by Medium Energy C$_{60}$ Impacts;Applied Physics Express;2011-11-10
3. Secondary ion counting for surface-sensitive chemical analysis of organic compounds using time-of-flight secondary ion mass spectroscopy with cluster ion impact ionization;Review of Scientific Instruments;2011-03
4. Transmission of cluster ions through a tandem accelerator of several stripper gases;Review of Scientific Instruments;2009-10
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3