Phase Transformations of Metallorganic Chemical Vapor Deposition Processed Alumina Coatings Investigated by In Situ Deflection-Reference-Cited by-同舟云学术

Phase Transformations of Metallorganic Chemical Vapor Deposition Processed Alumina Coatings Investigated by In Situ Deflection

Published:2007 Issue:5 Volume:154 Page:P63
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:en
Short-container-title:J. Electrochem. Soc.

Author:

Huntz Anne-Marie,Andrieux Michel,Vahlas Constantin,Sovar Maria-Magdalena,Samelor Diane,Gleizes Alain N.

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Reference14 articles.

1. CVD of Al2O3 Thin Films Using Aluminum Tri-isopropoxide

2. Formation of Thin Oxide Films by Metal-Organic Chemical Vapour Deposition

3. Growth of γ-Al2O3 thin films on silicon by low pressure metal-organic chemical vapour deposition

4. A. Gleizes, C. Vahlas, M.-M. Sovar, D. Samélor, and M.-C. Lafont , Chem. Vap. Deposition, Submitted.

5. D. Samélor, M.-M. Sovar, A. Stefanescu, A. N. Gleizes, P. Alphonse, and C. Vahlas , inFifteenth European Conference on Chemical Vapor Deposition EUROCVD-15, A. Devi , R. Fischer , W. Parala , M. D. Allendorf , and M. Hitchmer Editors, PV 2005-09, p. 1051, The Electrochemical Society Proceedings Series, Pennington, NJ (2005).

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