Deposition of Nonstoichiometric TiC at High Temperature
Author:
Affiliation:
1. CNRS/IMP, UP32, Université‐Avenue de Willeneuve, 66025 Perpignan Cedex, France
2. LTPCM, UA 29, Domaine Universitaire, 38402 Saint Martin D'Heres, France
3. CNRS/IMP, UP32, Université‐Avenue de Villeneuve, 66025 Perpignan Cedex, France
Publisher
The Electrochemical Society
Subject
Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials
Link
https://iopscience.iop.org/article/10.1149/1.2095560/pdf
Cited by 8 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Laser chemical vapor deposition of TiC on tantalum;Journal of Materials Science;2002
2. Thin TiC x films chemically vapour deposited onto cemented carbides from the TiCl 4 -CCl 4 -H 2 mixture;Thin Solid Films;1996-05
3. Auger electron spectroscopy of compounds in the Si-Ti-C system;Surface Science;1993-04
4. How to avoid decarburization of steel substrate during chemical vapour deposition of titanium carbide;Thin Solid Films;1991-07
5. Preparation of TiC films by photochemical vapour deposition using a D2 lamp;Thin Solid Films;1990-04
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