Structural and Optical Properties of N+ Implanted V2O5 Thin Film on Glass Substrate

Abstract

In this study, we investigate the effect of nitrogen (16 keV N+) ion implantation on V2O5 thin films with varying thicknesses, focusing on their structural, compositional, and optical characteristics. Through X-ray diffraction, we reveal the coexistence of orthorhombic and tetragonal phases, while UV–vis spectroscopy determines the band gap. Atomic force microscopy unveils the intriguing surface morphology, with the thickest film displaying high smoothness. Notably, grain formation and growth dynamics are intricately linked to roughness (α) and fractal dimension (Df) calculations. Additionally, wetting properties are connected to fractal growth in ion-implanted films. This work underscores the stable optical band gap of V2O5 thin films for optical applications and offers insights into managing wetting behaviors in nanofluidics through fractal patterns, potentially impacting nanotechnology and material engineering.