Impact of Dual-Gate Configuration on the Endurance of Ferroelectric Thin-Film Transistors With Nanosheet Polycrystalline-Silicon Channel Film

Author:

Ma William Cheng-YuORCID,Su Chun-JungORCID,Kao Kuo-Hsing,Cho Ta-Chun,Guo Jing-Qiang,Wu Cheng-Jun,Wu Po-Ying,Hung Jia-Yuan

Abstract

This work explores the characteristics of ferroelectric thin-film transistors (FeTFTs) utilizing an asymmetric dual-gate (DG) structure in both single-gate (SG) and DG operation modes. In the transfer characteristics, DG mode exhibits a memory window (MW) of 1.075 V, smaller than SG mode’s MW of 1.402 V, attributed to the back-gate bias effect causing a reduction in the device’s threshold voltage. However, DG mode demonstrates superior endurance characteristics with 106 cycles compared to SG mode’s 105 cycles. Additionally, the increase in erase pulse voltage (VERS) exacerbates the polycrystalline-silicon channel lattice damage of FeTFT, resulting in subthreshold swing (SS) degradation. Nevertheless, the extent of SS degradation from DG mode operation is significantly lower than that of SG mode, contributing to the superior endurance of DG mode. The elevation of program pulse voltage (VPRG) induces imprint and charge-trapping effects in the top-gate ferroelectric dielectric, leading to reduced endurance. Due to the use of SiO2 as the back-gate dielectric in FeTFT, DG mode exhibits lower impacts of charge-trapping effects from the top-gate ferroelectric dielectric layer, resulting in better endurance compared to SG mode. The asymmetric DG structure provides greater tolerance in the selection of VPRG and VERS.

Funder

National Science and Technology Council

Publisher

The Electrochemical Society

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3