Boron Doping Effect on Silicon Film Deposition in the Si2 H 6 ‐ B 2 H 6 ‐ He Gas System
Author:
Affiliation:
1. Nippon Telegraph and Telephone Corporation, Atsugi Electrical Communication Laboratories, Atsugi, Kanagawa, 243‐01 Japan
Publisher
The Electrochemical Society
Link
https://iopscience.iop.org/article/10.1149/1.2109002/pdf
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