Atomic Layer Etching: An Industry Perspective-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Atomic Layer Etching: An Industry Perspective

Published:2015 Issue:6 Volume:4 Page:N5005-N5009
ISSN:2162-8769
Container-title:ECS Journal of Solid State Science and Technology
language:en
Short-container-title:ECS J. Solid State Sci. Technol.

Author:

T. Carver Colin,J. Plombon John,E. Romero Patricio,Suri Satyarth,A. Tronic Tristan,B. Turkot Robert

Publisher

The Electrochemical Society

Subject

Electronic, Optical and Magnetic Materials

Reference27 articles.

1. Moore Gordon E. , Electronics Magazine, 4 (1965).

2. Fluorocarbon assisted atomic layer etching of SiO2 using cyclic Ar/C4F8 plasma

3. Atomic layer etching of InP using a low angle forward reflected Ne neutral beam

4. Fabrication of InAs composite channel high electron mobility transistors by utilizing Ne-based atomic layer etching

5. Molecular layer etching of GaAs

Cited by 139 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Plasma atomic layer etching of ruthenium by oxygen adsorption-removal cyclic process;Applied Surface Science;2024-10

2. Damage-Free Plasma Source for Atomic-Scale Processing;Nano Letters;2024-09-06

3. Silicon-28-Tetrafluoride as an Educt of Isotope-Engineered Silicon Compounds and Bulk Materials for Quantum Systems;Molecules;2024-09-05

4. Etch-stop mechanisms in plasma-enhanced atomic layer etching of silicon nitride: A molecular dynamics study;Journal of Vacuum Science & Technology A;2024-08-05

5. Molecular dynamics simulations of silicon nitride atomic layer etching with Ar, Kr, and Xe ion irradiations;Japanese Journal of Applied Physics;2024-07-01

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3