In Situ Stress Measurement of Electrodeposited Ni Films by Television Holographic Interferometry
-
Published:2010-02-22
Issue:34
Volume:25
Page:27-34
-
ISSN:1938-5862
-
Container-title:ECS Transactions
-
language:
-
Short-container-title:ECS Trans.
Author:
Fukumuro Naoki,Do Takayoshi,Kakunai Satoshi,Yae Shinji,Matsuda Hitoshi
Abstract
In situ stress measurements of electrodeposited Ni films from a sulfate bath during deposition were carried out by television holographic interferometry. The effect of the addition of saccharin sodium on the internal stress in the Ni films was studied. Structure change with film growth was investigated by cross-sectional TEM observation. Quantitative analysis of impurities and hydrogen in films was performed. The stress behaviors of Ni films changed drastically from a tensile direction to a compressive direction with an increase of the concentration of saccharin sodium.
Publisher
The Electrochemical Society