REBL nanowriter: Reflective Electron Beam Lithography-Reference-Cited by-同舟云学术

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REBL nanowriter: Reflective Electron Beam Lithography

Published:2009-03-13 Issue: Volume:7271 Page:727107
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Petric Paul,Bevis Chris,Brodie Alan,Carroll Allen,Cheung Anthony,Grella Luca,McCord Mark,Percy Henry,Standiford Keith,Zywno Marek

Publisher

SPIE

Cited by 28 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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3. Cost-effective and channel-scalable hardware decoders for multiple electron-beam direct-write systems;Journal of Micro/Nanolithography, MEMS, and MOEMS;2018-08-22

4. Parallel compression/decompression-based datapath architecture for multibeam mask writers;Journal of Micro/Nanolithography, MEMS, and MOEMS;2017-11-07

5. Electron beam throughput from raster to imaging;SPIE Proceedings;2016-12-22

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