High-NA EUV lithography exposure tool progress-Reference-Cited by-同舟云学术

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High-NA EUV lithography exposure tool progress

Published:2019-03-14 Issue: Volume: Page:
ISSN:
Container-title:Extreme Ultraviolet (EUV) Lithography X
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Author:

van Schoot Jan,van Setten Eelco,Troost Kars,Bornebroek Frank,van Ballegoij Rob,Lok Sjoerd,Stoeldraijer Judon,Finders Jo,Graeupner Paul,Zimmermann Joerg,Kuerz Peter,Pieters Marco,Kaiser Winfried

Publisher

SPIE

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Extreme ultraviolet scanner with high numerical aperture: obscuration and wavefront description;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-04-21

2. Exploration of alternative mask for 0.33NA extreme ultraviolet single patterning at pitch 28-nm metal design;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-04-07

3. 3D Unclonable Optical Identity for Universal Product Verification;2021 IEEE International Symposium on Hardware Oriented Security and Trust (HOST);2021-12-12

4. Advances in Optics and Exposure Devices Employed in Excimer Laser/EUV Lithography;Handbook of Laser Micro- and Nano-Engineering;2021

5. Real-time dose control for electron-beam lithography;Nanotechnology;2020-12-08

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