Laser-produced plasma source system development-Reference-Cited by-同舟云学术

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Laser-produced plasma source system development

Published:2007-03-16 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Fomenkov Igor V.,Brandt David C.,Bykanov Alexander N.,Ershov Alexander I.,Partlo William N.,Myers David W.,Böwering Norbert R.,Vaschenko Georgiy O.,Khodykin Oleh V.,Hoffman Jerzy R.,Vargas L. Ernesto,Simmons Rodney D.,Chavez Juan A.,Chrobak Christopher P.

Publisher

SPIE

Cited by 26 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Characteristics of tin droplet target system for EUV source research;Measurement Science and Technology;2023-12-29

2. Trends in photoresist materials for extreme ultraviolet lithography: A review;Materials Today;2023-07

3. Timing jitter of monodisperse droplets generated by capillary jet breakup;Physics of Fluids;2022-04

4. The spectrum of a 1-μm-wavelength-driven tin microdroplet laser-produced plasma source in the 5.5–265.5 nm wavelength range;AIP Advances;2021-12-01

5. EUV Sources;Handbook of Laser Micro- and Nano-Engineering;2021

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