Spectral reflectometry characterization of an extreme ultraviolet attenuated phase-shifting mask blank-Reference-Cited by-同舟云学术

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Spectral reflectometry characterization of an extreme ultraviolet attenuated phase-shifting mask blank

Published:2024-07-12 Issue:04 Volume:23 Page:
ISSN:2708-8340
Container-title:Journal of Micro/Nanopatterning, Materials, and Metrology
language:
Short-container-title:J. Micro/Nanopattern. Mats. Metro.

Author:

Shen Tao¹,Mochi Iacopo¹,Jeong Dongmin²,Mueller Elisabeth³,Ansuinelli Paolo¹,Ahn Jinho²,Ekinci Yasin¹

Affiliation:

1. Paul Scherrer Institute, Laboratory for X-Ray Nanoscience and Technologies, Villigen PSI, Switzerland

2. Hanyang University, Division of Materials Science and Engineering, Seoul, Republic of Korea

3. Paul Scherrer Institute, Laboratory of Nanoscale Biology, Villigen PSI, Switzerland

Publisher

SPIE-Intl Soc Optical Eng

Reference25 articles.

1. EUV lithography performance for manufacturing: status and outlook

2. EUV lithography: past, present and future

3. EUV Lithography Technology for High-volume Production of Semiconductor Devices

4. Metrology for the next generation of semiconductor devices

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