Design and performance of capping layers for EUV multilayer mirrors

Author:

Bajt Sasa,Chapman Henry N.,Nguyen Nhan,Alameda Jennifer B.,Robinson Jeffrey C.,Malinowski Michael E.,Gullikson Eric,Aquila Andy,Tarrio Charles,Grantham Steven

Publisher

SPIE

Cited by 41 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

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2. Influence of Impurity Atoms on Hydrogen Diffusion into Ruthenium;The Journal of Physical Chemistry C;2022-11-10

3. Diamond-like-carbon as a novel capping material for EUV mask blanks;Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology;2022-09-16

4. 极紫外光刻光源的研究进展及发展趋势;Laser & Optoelectronics Progress;2022

5. Tin deposition on ruthenium and its influence on blistering in multi-layer mirrors;Physical Chemistry Chemical Physics;2021

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