1. Assessing the Viability of Multi-Electron Beam Wafer Inspection for sub-20 nm Defects;Thiel,2014
2. Defect metrology challenges at the 11-nm node and beyond;Crimmins,2010
3. On the Limits of Miniature Electron Column Technology;Muray,2014
4. Further advancing the throughput of a multi-beam SEM.;Kemen,2015
5. High throughput defect detection with multiple parallel electron beams;van Himbergen,2007