Development of high-power EUV sources for lithography-Reference-Cited by-同舟云学术

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Development of high-power EUV sources for lithography

Published:2002-07-05 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Emerging Lithographic Technologies VI
language:
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Author:

Borisov Vladimir M.,Ahmad Imtiaz,Goetze S.,Ivanov Alexander S.,Khristoforov Oleg B.,Kleinschmidt Juergen,Korobotchko Vladimir,Ringling Jens,Schriever Guido,Stamm Uwe,Vinokhodov Aleksandr Y.

Publisher

SPIE

Cited by 15 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Next-generation lithography for 22 and 16 nm technology nodes and beyond;Science China Information Sciences;2011-05

2. Xenon Discharge-Produced Plasma Radiation Source for EUV Lithography;IEEE Transactions on Industry Applications;2010-07

3. Extreme ultraviolet lithography: A review;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2007

4. Subnanosecond Thomson scattering on a vacuum arc discharge in tin vapor;Physical Review E;2005-08-31

5. A high efficiency ultrahigh vacuum compatible flat field spectrometer for extreme ultraviolet wavelengths;Review of Scientific Instruments;2005-08

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