Researching new EUV pellicle films for source powers beyond 250 watts-Reference-Cited by-同舟云学术

Researching new EUV pellicle films for source powers beyond 250 watts

Published:2016-10-20 Issue: Volume: Page:
ISSN:0277-786X
Container-title:32nd European Mask and Lithography Conference
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Author:

Nasalevich Maxim¹,van Zwol Pieter Jan¹,Abegg Erik¹,Voorthuijzen Pim¹,Vles David¹,Péter Mária¹,van der Zande Wim¹,Vermeulen Hans¹

Affiliation:

1. ASML Netherlands B.V. (Netherlands)

Publisher

SPIE

Reference6 articles.

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2. Pirati A, Peeters R, Smith D, Lok S, Minnaert A, van Noordenburg M, Mallmann J, Harned N, Stoeldraijer J et al 2015 Proc. SPIE 9422 94221P-1

3. Goldfarb D, Proc. SPIE 9635, Photomask Technology 2015, 96350A (October 23, 2015) doi:10.1117/12.2196901

4. Emissivity of freestanding membranes with thin metal coatings

5. Gao A, Analysis of Extreme Ultraviolet Induced Surface Defect Process, 2015 Ph.D Thesis, University of Twente, Enschede (NL) ISBN: 978-90-365-3985-2

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