The importance of less damaged and surface sensitive metrology to identify true EUV process monitoring-Reference-Cited by-同舟云学术

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The importance of less damaged and surface sensitive metrology to identify true EUV process monitoring

Published:2024-04-10 Issue: Volume:12 Page:40
ISSN:
Container-title:Metrology, Inspection, and Process Control XXXVIII
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Author:

Lim GwangSeob,Jang EunKyeong,Choi BoGyeong,An Jihyun,Kang MinWoo,Lim Sunghun,Cho Jong-Hoi,Mun Daiyoung,Alkoken Ran,Vol Tal,Branzburg Yana,Kim YouJin,Yeo Jeong-Ho,Choi KyungJae,Han Kyeongju,Lim Sujin,Cho Jaemin,Lim JaeEun,Jung WooSung,Kwak Chanhee,Shin Hyeon Sang

Publisher

SPIE

Reference27 articles.

1. Line-edge roughness from extreme ultraviolet lithography to fin-field-effect-transistor: Computational study;Kim;Micromachines,2021

2. Review of metal-containing resists in electron beam lithography: perspectives for extreme ultraviolet patterning

3. Recent developments in photoresists for extreme-ultraviolet lithography

4. Mean Free Path of Electrons in Organic Photoresists for Extreme Ultraviolet Lithography in the Kinetic Energy Range 20–450 eV

5. Light-matter interactions in photoresists for extreme ultraviolet lithography;Vesters,2019

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