Enabling sub-10nm node lithography: presenting the NXE:3400B EUV scanner-Reference-Cited by-同舟云学术

Enabling sub-10nm node lithography: presenting the NXE:3400B EUV scanner

Published:2017-03-24 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

van de Kerkhof Mark¹,Jasper Hans¹,Levasier Leon¹,Peeters Rudy¹,van Es Roderik¹,Bosker Jan-Willem¹,Zdravkov Alexander¹,Lenderink Egbert¹,Evangelista Fabrizio¹,Broman Par¹,Bilski Bartosz¹,Last Thorsten¹

Affiliation:

1. ASML Netherlands B.V. (Netherlands)

Publisher

SPIE

Reference13 articles.

1. EUV Lithography Performance for Manufacturing: Status and Outlook;Pirati,2016

2. A. Pirati, “The future of EUV Lithography”, SPIE Advanced Lithography 2017, to be published

3. Scaling LPP EUV sources to meet HVM requirements;Schafgans,2017

4. NXE Pellicle development update;Janssen,2016

5. Free-standing spectral purity filters for extreme ultraviolet lithography;Chkhalo,2012

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