PML2: the maskless multibeam solution for the 22nm node and beyond-Reference-Cited by-同舟云学术

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PML2: the maskless multibeam solution for the 22nm node and beyond

Published:2009-03-13 Issue: Volume:7271 Page:72710N
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Klein C.,Platzgummer E.,Klikovits J.,Piller W.,Loeschner H.,Bejdak T.,Dolezel P.,Kolarik V.,Klingler W.,Letzkus F.,Butschke J.,Irmscher M.,Witt M.,Pilz W.,Jaschinsky P.,Thrum F.,Hohle C.,Kretz J.,Nogatch J. T.,Zepka A.

Publisher

SPIE

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Stitch-Aware Routing Considering Smart Boundary for Multiple E-Beam Lithography;2020 International Symposium on VLSI Design, Automation and Test (VLSI-DAT);2020-08

2. Design and fabrication of electrostatic microcolumn in multiple electron-beam lithography;SPIE Proceedings;2016-03-22

3. Stitch-Aware Routing for Multiple E-Beam Lithography;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2015-03

4. Feasibility study of optical/e-beam complementary lithography;SPIE Proceedings;2012-03-01

5. Optical maskless lithography;Russian Microelectronics;2011-11

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