Plasma chemistry of He/O2/SiH4and He/N2O/SiH4mixtures for remote plasma‐activated chemical‐vapor deposition of silicon dioxide
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.355115
Reference46 articles.
1. Characterization of Plasma‐Deposited Silicon Dioxide
2. Plasma-enhanced CVD of high quality insulating films
3. Low‐temperature deposition of high‐quality silicon dioxide by plasma‐enhanced chemical vapor deposition
4. Production of silicon oxides from the glow discharge decomposition of silane and NO2
5. Effects of Excited Plasma Species on Silicon Oxide Films Formed by Microwave Plasma CVD
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