Sn-mediated Ge∕Ge(001) growth by low-temperature molecular-beam epitaxy: Surface smoothening and enhanced epitaxial thickness
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1848188
Reference56 articles.
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4. Growth morphology and the equilibrium shape: The role of ‘‘surfactants’’ in Ge/Si island formation
5. Molecular beam epitaxial growth of Si on Ga‐activated Si(111) surface
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