The initial stages of the oxidation of titanium nitride
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.351324
Reference15 articles.
1. Interstitial compounds
2. Low temperature oxidation behavior of reactively sputtered TiN by x‐ray photoelectron spectroscopy and contact resistance measurements
3. Oxidation kinetics of TiN thin films
4. Applications of TiN thin films in silicon device technology
5. Advanced metallization of very-large-scale integration devices
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