Stability of hydrogenated amorphous silicon deposited at high temperatures with a remote hydrogen plasma
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.105282
Reference10 articles.
1. Hydrogen in amorphous semiconductors
2. Light-induced metastable defects in hydrogenated amorphous silicon: A systematic study
3. Saturation of the light‐induced defect density in hydrogenated amorphous silicon
4. Hydrogen incorporation in silicon thin films deposited with a remote hydrogen plasma
5. Characterization of a remote hydrogen plasma reactor with electron spin resonance
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