Surface chemistry and Fermi level movement during the self-cleaning of GaAs by trimethyl-aluminum

Abstract

The removal of the native oxides from NH4OH-cleaned p-GaAs (100) by exposure to trimethyl-aluminum (TMA) was studied by in situ photoelectron spectroscopy using synchrotron radiation. The reduction of high-valence As- and Ga-oxides occurred through different routes: while As3+ was reduced to As(1±Δ)+ suboxides (with 0 ≤ Δ ≤ 1), Ga3+ was directly removed. The surface Fermi level was shifted by about 100 meV towards the valence band edge upon TMA exposure. This indicates that removing the native oxide of GaAs by TMA is insufficient to create interfaces between GaAs and Al2O3 with defects densities below the 1012 cm−2 range.