Effect of target size on dose uniformity in plasma-based ion implantation
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.365312
Reference13 articles.
1. Plasma source ion‐implantation technique for surface modification of materials
2. Advanced surface treatments by plasma ion implantation
3. Child-Langmuir sheath structure around wedge-shaped cathodes
4. Sheath expansion at a corner
5. Self‐similar sheath expansion from a segmented planar electrode
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