Investigation on performance degradation mechanism of GaN p–i–n diode under proton irradiation

Author:

Tang Yun123ORCID,Wang Lei13ORCID,Cai Xiaowu13ORCID,Lu Peng13ORCID,Li Bo13ORCID

Affiliation:

1. Institute of Microelectronics, Chinese Academy of Sciences 1 , Beijing 100029, China

2. University of Chinese Academy of Sciences 2 , Beijing 100049, China

3. Key Laboratory of Science and Technology on Silicon Devices, Chinese Academy of Sciences 3 , Beijing 100029, China

Abstract

Radiation effects of a 150 keV proton beam with various fluences on GaN-based quasi-vertical p–i–n diodes are investigated. For fundamental analysis, the electrical properties of P-GaN and N−-GaN separated from p–i–n diodes are also investigated. With the increase in the radiation-induced defect (e.g., VN and VGa) density, the carrier concentrations and mobilities of P-GaN and N−-GaN decrease significantly. Under the proton fluence of 1 × 1015 p/cm2, P-GaN has been transformed into highly resistive N-GaN, resulting in p–i–n diodes losing electrical characteristics of the PN junction. Meanwhile, the P-GaN Ohmic contact has been converted to Schottky contact. In addition, due to a large number of radiation-induced defects in P-GaN and N−-GaN, the reverse leakage current mechanism is revealed to change from space-charge-limited current conduction to Ohmic conduction.

Funder

National Natural Science Foundation of China

Innovation Center of Radiation Application

Institute of Modern Physics Project Chinese Academy of science

Youth Innovation Promotion Association CAS

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Cited by 1 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Radiation damage in GaN/AlGaN and SiC electronic and photonic devices;Journal of Vacuum Science & Technology B;2023-04-19

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