Characterization of the diffraction properties of quantum-dot-array diffraction grating

Author:

Wang Chuanke1,Kuang Longyu1,Wang Zhebin1,Liu Shenye1,Ding Yongkun1,Cao Leifeng2,Foerster Eckhart2,Wang Deqiang3,Xie Changqing3,Ye Tianchun3

Affiliation:

1. National Key Laboratory of Laser Fusion , Research Center of Laser Fusion, China Academy of Engineering Physics, P.O. Box 919-986, Mianyang, Sichuan 621900, People’s Republic of China

2. Friedrich-Schiller-University Jena X-ray Optics Group, Institute of Optics and Quantum Electronics, , Max-Wien-Platz 1, 07743 Jena, Germany

3. Institute of Microelectronics Key Laboratory of Nano-Fabrication and Novel Devices Integrated Technology, , Chinese Academy of Sciences, Beijing, 100029, People’s Republic of China

Abstract

A new dispersive element named as quantum-dot-array diffraction grating [L. F. Cao, China patent No. 200410081499 (August 10, 2004)] for visible light has been developed and characterized experimentally. A large number of quantum dots distributed on a substrate as sinusoidal function can be used to diffract x rays without higher-order diffraction. The experimental patterns show that the higher-order diffractions which inevitably exist in the spectrum recorded using traditional diffraction gratings can be eliminated effectively by this newly designed element. It indicates that quantum-dot-array diffraction grating could be an attractive alternative of presently used diffraction grating in soft x-ray spectroscopy application to get rid of the higher-order diffraction distortions.

Publisher

AIP Publishing

Cited by 23 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.7亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2025 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3