Nanoscale GaAs metal–semiconductor–metal photodetectors fabricated using nanoimprint lithography
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.123858
Reference6 articles.
1. Nanoscale tera-hertz metal-semiconductor-metal photodetectors
2. Nanoimprint lithography
3. Nanoscale silicon field effect transistors fabricated using imprint lithography
4. Double 15-nm-wide metal gates 10 nm apart and 70 nm thick on GaAs
5. Surface Damage on GaAs Induced by Reactive Ion Etching and Sputter Etching
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